FUJIFILM Electronic Materials provides a comprehensive range of metal ion free (MIF) photoresist developers suitable for immersion and in-line track development.
In addition, metal ion containing (MIC) developers are available to those customers that continue to use this technology.
Other alkalinities and surfactant families are also available.
Contact Us for more information
Contact Us for more information
We offer a full range of high purity Metal Ion Free (MIF) & Metal Ion Containing (MIC) developers for the lithographic patterning of negative photoresist, g-line, i-line and advanced photoresists